US7218503B2 | 合法醫療器材資訊網
2showsanillustrativemonopolarESC60housedbytheprocessingchamber10ofFIG.1inaccordancewithoneembodimentofthepresentinvention.
CROSS REFERENCE To RELATED APPLICATIONThis patent application is a continuation-in-part of U.S. patent application Ser. No. 10/126,832 that was filed on Apr. 18, 2002 now U.S. Pat. No. 6,965,506, from which priority under 35 U.S.C. § 120 is claimed, entitled “System and Method for Dechucking a Workpiece for an Electrostatic Chuck” which is a continuation-in-part of U.S. patent application Ser. No. 09/163,368 that was filed on Sep. 30, 1998 now U.S. Pat. No. 6,790,375 and entitled “Dechucking Method and Apparatus for Wafers in Vacuum Processors.” U.S. patent application Ser. No. 10/126,832 is also a nonprovisional patent application claiming priority from U.S. Provisional Patent Application No. 60/322,580 filed on Sep. 14, 2001 entitled “A Dechucking Algorithm for Electrostatic Chucks With Voltage Polarity Reversal.” All of these aforementioned patent applications are hereby incorporated by reference.
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Design space of electrostatic chuck in etching chamber | 合法醫療器材資訊網
(PDF) Modeling of Electrostatic Chuck and Simulation of ... | 合法醫療器材資訊網
US7218503B2 | 合法醫療器材資訊網
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電漿製程環境中雙極性靜電吸盤的量測與開發 | 合法醫療器材資訊網
Principles of Electrostatic Chucks | 合法醫療器材資訊網
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